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OHB Automatic Dust Removal System for Semiconductor Manufacturing

Overview

Developed by Villo, the VS-AOC-01 OHB Automatic Dust Removal System is designed for the high cleanliness requirements of semiconductor wafer manufacturing and automated material handling.

Its non-contact cleaning technology and multi-axis coordination enable precise removal of fine particles while helping reduce secondary contamination risks.

Features

  • Non-Contact Dust Removal
    • Multi-Axis Coordination
    • Ultra-Fine Particle Removal
  • Reduced Secondary Contamination Risks
  • Designed for Semiconductor Manufacturing
  • villo-wet-type-explosion-proof-dust-collector
  • ohb-automatic-dust-removal-system-semiconductor
  • villo-wet-type-explosion-proof-dust-collector

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พารามิเตอร์ทางเทคนิค

Item Specification
Model VS-AOC-01
Dimensions (W × D × H) 388 × 353 × 337 mm
Dust Removal Performance (Remaining Particle Count After Cleaning) ≤ 20 particles/cm² (0.3 μm)
Cleaning Area OHB Surface
Weight (kg) ≤ 11
Maximum Power (W) 700
Cleaning Capacity per Full Charge 15–20 cleaning cycles
Noise Level (dB) ≤ 80
Filtration Grade U15
Material Aluminum Alloy, PEEK, etc.

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